质子诱导的污染物膜对紫外反射镜的影响。

Proton-induced contaminant film effects on ultraviolet reflecting mirrors.

作者信息

Gillette R B, Kenyon B A

出版信息

Appl Opt. 1971 Mar 1;10(3):545-51. doi: 10.1364/AO.10.000545.

DOI:10.1364/AO.10.000545

PMID:20094488

Abstract

The effects of thin, polymer contaminant films on the reflectance and scattered light properties of far ultraviolet reflecting mirrors were studied. Deposition of the contaminant films was induced by irradiating the mirrors with 10-keV protons in a high vacuum environment containing hydrocarbon molecules. Contaminant films were deposited using integrated fluxes up to 10(16) protons-cm(-2), and a flux of about 1.4 x 10(11) protons-cm(-2) sec(-1). Contaminant film effects were studied on mirror coatings of evaporated aluminum coated with MgF(2), aluminum coated with LiF, and platinum. Results of experiments showed that a film as thin as 4-5 nm produced large reflectance degradation in selected wavelength bands as a result of interference-type effects. Radiation-induced degradation of MgF(2), LiF, and Al film was shown to be negligible. An oxidation cleaning technique was developed that successfully removed the contaminant film and restored reflectance to nearly preirradiation values.

摘要

研究了薄聚合物污染膜对远紫外反射镜反射率和散射光特性的影响。在含有烃分子的高真空环境中，用10keV质子辐照反射镜，诱导污染膜的沉积。使用高达10(16)质子·厘米(-2)的积分通量和约1.4×10(11)质子·厘米(-2)·秒(-1)的通量沉积污染膜。研究了污染膜对涂有MgF(2)的蒸发铝、涂有LiF的铝和铂的镜面涂层的影响。实验结果表明，由于干涉型效应，厚度仅为4-5nm的薄膜在选定的波段会产生较大的反射率下降。结果表明，MgF(2)、LiF和Al膜的辐射诱导降解可忽略不计。开发了一种氧化清洗技术，该技术成功地去除了污染膜，并将反射率恢复到接近辐照前的值。