Department of Physics and Applied Physics, and Nanomanufacturing Center, University of Massachusetts Lowell, One University Avenue, Lowell, MA 01854, USA.
Nanotechnology. 2010 Feb 19;21(7):75304. doi: 10.1088/0957-4484/21/7/075304. Epub 2010 Jan 21.
We studied the pulse energy threshold of surface nano-/micro-morphology modifications by irradiating Si, GaAs, GaP, InP, Cu and Ti surfaces with 100 fs laser pulses at a wavelength of 800 nm in air and in water. We found that the laser pulse energy thresholds required for the permanent modification in water are up to 30% lower than those in air. Different non-equilibrium dynamics processes of the surface melting layer cause the different thresholds in water and in air.
我们研究了通过在空气和水中用 800nm 波长的 100fs 激光脉冲辐照 Si、GaAs、GaP、InP、Cu 和 Ti 表面，对表面纳米/微米形貌进行修饰的脉冲能量阈值。我们发现，水的永久修饰所需的激光脉冲能量阈值比空气低 30%。表面熔化层的不同非平衡动力学过程导致了在水和空气中的不同阈值。
