Hass G, Ramsey J B, Hunter W R
Appl Opt. 1969 Nov 1;8(11):2255-9. doi: 10.1364/AO.8.002255.
The reflectance of semitransparent Pt films deposited on various substrates at close to room temperature was measured at lambda = 584 A and lambda = 736 A and in the wavelength region 1000-2000 A and was compared with that of opaque films of Pt. All Pt films were prepared by high-vacuum evaporation with an electron gun and deposited on the substrates most frequently used in spectrographs: glass and fused quartz of which most mirrors are made, evaporated Al and Au in which diffraction gratings are ruled, and semitransparent Cr on glass used to increase the adherence of Pt films. At lambda = 584 A and 736 A thin semitransparent films of t = 100-200 A showed higher reflectance than opaque ones for all substrates with the exception of Au. At wavelengths longer than 1000 A, thin Pt films showed an increase in reflectance over that of opaque Pt, if deposited on glass, but had extremely low reflectance values when deposited on Al. Calculations made to explain the experimentally determined reflectance behavior of thin Pt films on the various substrates are discussed.
在接近室温的条件下，测量了沉积在各种衬底上的半透明铂薄膜在波长λ = 584 Å和λ = 736 Å以及1000 - 2000 Å波长范围内的反射率，并与不透明铂薄膜的反射率进行了比较。所有铂薄膜均通过电子枪在高真空下蒸发制备，并沉积在光谱仪中最常用的衬底上：大多数反射镜由其制成的玻璃和熔融石英、刻有衍射光栅的蒸发铝和金，以及用于提高铂薄膜附着力的玻璃上的半透明铬。在λ = 584 Å和736 Å时，厚度t = 100 - 200 Å的半透明薄膜对除金以外的所有衬底显示出比不透明薄膜更高的反射率。在波长大于1000 Å时，如果沉积在玻璃上，薄铂薄膜的反射率比不透明铂薄膜有所增加，但沉积在铝上时反射率极低。文中讨论了为解释在各种衬底上薄铂薄膜的实验测定反射率行为所做的计算。
