National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki, Japan.
Nanotechnology. 2010 Mar 5;21(9):095304. doi: 10.1088/0957-4484/21/9/095304. Epub 2010 Feb 3.
Top-down fabrication processes for nanostructures are superior to bottom-up processes from the aspect of long-range order, but have limitations in their processing time and/or material selection. Here we developed a nanopatterning method for 'nanostripes' that incorporates deposition of a multilayer film on a microscale slope array and mechanical polishing. This method is used to fabricate a nanostripe structure consisting of two kinds of materials to form a stripe array on a silicon substrate. Although this nanopatterning method is categorized as a top-down fabrication process, the fabrication efficiency is quite high, because the number of nanostripes is 'multiplied' by the number of multilayered films. Another feature of the nanostripe is renewability; even if the nanostripe surface is damaged, the underlying nanostructure can be exposed and form a similar nanostripe by polishing. The nanostripe structure can be easily applied to a wide range of fields due to its ease of production.
自上而下的纳米结构制造工艺在长程有序方面优于自下而上的工艺，但在加工时间和/或材料选择方面存在局限性。在这里，我们开发了一种用于“纳米条”的纳米图案化方法，该方法将多层膜沉积在微尺度斜坡阵列上并进行机械抛光。该方法用于在硅衬底上制造由两种材料组成的纳米条结构以形成条纹阵列。尽管这种纳米图案化方法被归类为自上而下的制造工艺，但由于多层膜的数量，制造效率相当高。纳米条的另一个特点是可更新性;即使纳米条表面受损，也可以通过抛光暴露下面的纳米结构，并形成类似的纳米条。由于其易于生产，纳米条结构可以很容易地应用于广泛的领域。
