Bartolini R A
Appl Opt. 1974 Jan 1;13(1):129-39. doi: 10.1364/AO.13.000129.
Recording of relief phase holograms in Shipley AZ-1350 positive photoresist is investigated in this report. It is found that the use of Shipley AZ-303 developer with Shipley AZ-1350 photoresist relieves the material nonlinearity usually associated with photoresists, thereby allowing higher image readout efficiencies. The use of Shipley AZ-303 developer also provides an increase in material sensitivity. A theoretical model for positive photoresist exposure characteristics is developed and verified by empirical results. Using Shipley AZ-303 developer, a design procedure for recording useful (i.e., acceptable SNR > 25 dB, high efficiency ~3-5%, exposure sensitivity ~ a few mJ.cm(-2)) relief phase holograms in Shipley AZ-1350 positive photoresist is synthesized.
本报告研究了在Shipley AZ - 1350正性光刻胶中记录浮雕相全息图的情况。研究发现，将Shipley AZ - 303显影剂与Shipley AZ - 1350光刻胶配合使用，可缓解通常与光刻胶相关的材料非线性问题，从而实现更高的图像读出效率。使用Shipley AZ - 303显影剂还能提高材料灵敏度。开发了一种正性光刻胶曝光特性的理论模型，并通过实验结果进行了验证。利用Shipley AZ - 303显影剂，合成了在Shipley AZ - 1350正性光刻胶中记录有用（即，可接受的信噪比> 25 dB，高效率~ 3 - 5%，曝光灵敏度~几mJ·cm(-2)）浮雕相全息图的设计流程。
