Institute for Materials Science, Universität Stuttgart, 70569 Stuttgart, Germany.
Langmuir. 2010 Mar 16;26(6):3774-8. doi: 10.1021/la903636k.
Lithographically defined self-growing ZnO films were prepared by a bioinspired chemical bath deposition technique (CBD). We observed a high selectivity of ZnO deposition: Teflon-like per-fluoro-decyl-trichlorosilane (FDTS) monolayers repelled ZnO primary particles, whereas amino-functionalized areas of the substrate were selectively covered by a highly anisotropic, oriented, and compact ZnO film with a thickness of 50 nm. The size of the primary particles in our methanol-based solution was approximately 2.5 nm. On the amino substrate they formed agglomerates not larger than 30 nm. Monolayer patterns made by polymer blend lithography were templated with an edge resolution of 30 nm. By using a specialized derivative of microcontact printing, we prepared layout-defined silane templates, which reliably determined the growth of a layout-defined, patterned oxide film with submicrometer lateral resolution.
采用生物启发的化学浴沉积技术（CBD）制备了光刻定义的自生长 ZnO 薄膜。我们观察到 ZnO 沉积具有很高的选择性：聚四氟乙烯样全氟癸基三氯硅烷（FDTS）单层排斥 ZnO 初级粒子，而基底的氨基功能化区域则被高度各向异性、取向和致密的 ZnO 薄膜选择性覆盖，厚度为 50nm。我们在甲醇基溶液中的初级粒子大小约为 2.5nm。在氨基基底上，它们形成的团聚体不超过 30nm。由聚合物共混光刻制备的单层图案通过边缘分辨率为 30nm 的模板进行模板化。通过使用微接触印刷的专用衍生物，我们制备了布局定义的硅烷模板，这些模板可靠地确定了具有亚微米横向分辨率的布局定义、图案化氧化物薄膜的生长。
