Sloane N J, Harwit M
Appl Opt. 1976 Jan 1;15(1):107-14. doi: 10.1364/AO.15.000107.
This paper gives a brief survey of the design of masks for Hadamard spectrometers and image scanners. Three different criteria are described for judging a mask, as well as techniques for choosing masks that are not too far from the optimum.