Sloane N J, Harwit M, Tai M H
Appl Opt. 1978 Sep 15;17(18):2991-3002. doi: 10.1364/AO.17.002991.
This paper analyzes the systematic errors in Hadamard transform optical instruments caused by moving masks, incorrect mask alignment, faulty mask fabrication, missing data, diffraction, etc. and describes techniques for reducing or eliminating these errors. In a great many cases the behavior of the instrument can be characterized by a single matrix equation of the form eta = TWa + e, where the components of eta are the measurements, T is a matrix characterizing the instrument, W specifies the mask configurations, a is a vector containing the unknown spectral intensities, and the components of e are small random errors.
本文分析了由移动掩模、掩模对准不正确、掩模制造缺陷、数据缺失、衍射等因素导致的哈达玛变换光学仪器中的系统误差，并描述了减少或消除这些误差的技术。在许多情况下，仪器的行为可以用一个单一的矩阵方程来表征，形式为η = TWa + e，其中η的分量是测量值，T是表征仪器的矩阵，W指定掩模配置，a是包含未知光谱强度的向量，e的分量是小的随机误差。
