Austin S, Stone F T
Appl Opt. 1976 Sep 1;15(9):2126-30. doi: 10.1364/AO.15.002126.
In this paper we discuss the experimental verification of an empirical photoresist model presented previously. Photoresist grating depths predicted by the model are found to be in good agreement with those obtained from diffraction efficiency measurements. Total rates of field decay alpha(T) obtained from a theoretical analysis of the photoresist grating coupler predicted by the model are also in good agreement with values measured by two independent experimental techniques. These results indicate the usefulness of the model in fabricating periodic devices in photoresist.
在本文中，我们讨论了先前提出的经验光刻胶模型的实验验证。发现该模型预测的光刻胶光栅深度与通过衍射效率测量获得的深度高度吻合。从该模型预测的光刻胶光栅耦合器的理论分析中获得的场衰减总速率α(T)也与通过两种独立实验技术测量的值高度吻合。这些结果表明该模型在光刻胶中制造周期性器件方面的有用性。
