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来自旋转低温固态氙靶的激光等离子体碎片。

Laser-plasma debris from a rotating cryogenic-solid-Xe target.

作者信息

Amano Sho, Inaoka Yutaka, Hiraishi Hiroki, Miyamoto Shuji, Mochizuki Takayasu

机构信息

Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori, Ako-gun, Hyogo 678-1205, Japan.

出版信息

Rev Sci Instrum. 2010 Feb;81(2):023104. doi: 10.1063/1.3293461.

Abstract

We investigate the characteristics of laser plasma debris that is responsible for damaging optics. The debris is composed of fast ions, neutral particles, and fragments, and originates from a solid Xe target on a rotating drum that we developed as an extreme ultraviolet (EUV) source. The ice fragments appear to be a problem most notably with solid Xe targets; however, we find that the damage induced by Xe ice fragments can be avoided by simply reducing the laser pulse energy. We find the number of fast neutral particles to be an order of magnitude less than the number of ions, and we clarify that the plasma debris is primarily composed of fast ions. In addition, we find that the number of fast ions having a few dozen keV of energy decreases when using the rotating target compared with the rest target. We attribute this to a gas curtain effect from the Xe gas localized at the rotating target surface. We estimate the sputtering rate of the Mo/Si mirror, which is caused primarily by the fast ions, to be 104 nm/1x10(6) shots at 190 mm from the source plasma and at an 11.25 degree angle from the incident laser beam. Up to the 1x10(6) shots exposure, remarkable degradation of the mirror reflectivity is not observed though the sputtering damages the mirror. Mitigation of the ions by using gas and/or magnetic fields will further improve the mirror lifetime. By comparing with a liquid jet Xe target, we conclude that the sputtering rate per conversion efficiency when using the solid Xe targets on the rotating drum is the same as that when using the liquid Xe targets. The high conversion efficiency of 0.9% in the rotating drum solid Xe target makes this technique useful for developing laser plasma EUV sources.

摘要

我们研究了导致光学元件损坏的激光等离子体碎片的特性。这些碎片由快速离子、中性粒子和碎片组成,源自我们开发的作为极紫外(EUV)源的旋转鼓上的固态氙靶。冰碎片似乎是固态氙靶最显著的问题;然而,我们发现通过简单降低激光脉冲能量就可以避免氙冰碎片造成的损坏。我们发现快速中性粒子的数量比离子数量少一个数量级,并明确等离子体碎片主要由快速离子组成。此外,我们发现与静止靶相比,使用旋转靶时能量为几十keV的快速离子数量会减少。我们将此归因于旋转靶表面局部存在的氙气产生的气幕效应。我们估计主要由快速离子导致的钼/硅镜的溅射速率在距源等离子体190毫米处且与入射激光束呈11.25度角时为104纳米/1×10⁶次脉冲。在高达1×10⁶次脉冲的曝光过程中,尽管溅射会损坏镜子,但未观察到镜子反射率有明显下降。通过使用气体和/或磁场减轻离子影响将进一步提高镜子的使用寿命。通过与液体喷射氙靶比较,我们得出在旋转鼓上使用固态氙靶时每转换效率的溅射速率与使用液体氙靶时相同。旋转鼓固态氙靶0.9%的高转换效率使得该技术对于开发激光等离子体EUV源很有用。

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