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使用低能离子注入对碳纳米管进行掺杂。

Doping of carbon nanotubes using low energy ion implantation.

作者信息

Jang Jin Ho, Lim Seong Chu, Duong Dihn Loc, Kim Gunn, Yu Woo Jong, Han Kang Hee, Min Yo-Sep, Lee Young Hee

机构信息

BK21 Physics Division, Sungkyunkwan University, Suwon 440-746, Republic of Korea.

出版信息

J Nanosci Nanotechnol. 2010 Jun;10(6):3934-9. doi: 10.1166/jnn.2010.1989.

Abstract

Carbon nanotubes (CNTs) were implanted with thermally decomposed oxygen (O2+) and nitrogen (N2+) ions at an acceleration voltage of 20 V. With a low dose of oxygen ions, the CNT-FET exhibited p-type behaviors with substantial changes in threshold voltage and in the slope of the source-drain current (l(sd)). However, at high dosages, the device exhibited metallic behaviors. After nitrogen doping, we did not observe the effects of electron doping. Instead, nitrogen doping significantly increased l(sd) with no gating effect. Our theoretical results showed that the metallic behavior of nitrogen-doped CNTs arose from the impurity conduction band, which results from the overlapping wave function of the nitrogen impurity.

摘要

在20V的加速电压下,用热分解的氧离子(O2+)和氮离子(N2+)注入碳纳米管(CNT)。在低剂量氧离子注入时,碳纳米管场效应晶体管(CNT-FET)表现出p型行为,阈值电压和源漏电流(l(sd))斜率发生显著变化。然而,在高剂量时,该器件表现出金属行为。氮掺杂后,我们未观察到电子掺杂的效果。相反,氮掺杂显著增加了l(sd),且没有门控效应。我们的理论结果表明,氮掺杂碳纳米管的金属行为源于杂质导带,这是由氮杂质的波函数重叠导致的。

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