ACS Appl Mater Interfaces. 2009 Apr;1(4):746-9. doi: 10.1021/am900018j.
A simple method that allows selective positioning of nanoparticles into mesoporous monolayer or multilayer thin films is presented. This technique applies UV lithography in order to bring about in situ light-induced reduction of silver in templated cavities of TiO2. The nanoparticle lithography presented here provides a novel approach to hierarchical lithography patterning for multifunctional devices.
本文提出了一种简单的方法,可以将纳米颗粒选择性地定位到介孔单层或多层薄膜中。该技术采用紫外光刻,以实现 TiO2 模板腔体内的银的原位光诱导还原。本文提出的纳米颗粒光刻为多功能器件的分级光刻图案提供了一种新方法。