Surface Physics Laboratory (National Key Laboratory), Fudan University, Shanghai, People's Republic of China.
Nanotechnology. 2010 Apr 30;21(17):175701. doi: 10.1088/0957-4484/21/17/175701. Epub 2010 Apr 1.
Multilayer ordered GeSi quantum dots (QDs) with thin Si spacers were obtained via self-assembly on pit-patterned Si(001) substrates. The lateral ordering of GeSi QDs predetermined by the periodic pit pattern results in remarkably improved size uniformity in comparison with random QDs on flat substrates. A much stronger and narrower photoluminescence (PL) peak from ordered QDs were observed than that from random ones, particularly at high excitation power. Such enhanced PL signal was attributed to the high density of states and the uniform distribution of excitons in the ordered and uniform QDs, which can efficiently suppress the Auger effect and the Coulomb screening effect. Moreover, anomalous narrowing of the PL peak from the ordered QDs with the excitation power was observed, which was explained in terms of distributed feedback associated with the periodic stacked GeSi QDs.
通过在具有凹坑图案的 Si(001)衬底上自组装,获得了具有薄 Si 间隔层的多层有序 GeSi 量子点 (QD)。由周期性凹坑图案预定的 GeSi QD 的横向有序导致与在平坦衬底上的随机 QD 相比,尺寸均匀性显著提高。与随机 QD 相比,有序 QD 表现出更强且更窄的光致发光 (PL) 峰,尤其是在高激发功率下。这种增强的 PL 信号归因于在有序和均匀 QD 中高态密度和激子的均匀分布,这可以有效地抑制俄歇效应和库仑屏蔽效应。此外,还观察到有序 QD 的 PL 峰随激发功率的异常变窄,这可以用与周期性堆叠的 GeSi QD 相关的分布式反馈来解释。