Kim Young Ja, Park Soo Yeon, Lee Jae Jong
Nano-Mechanical Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 305-600, Korea.
J Nanosci Nanotechnol. 2010 May;10(5):3232-5. doi: 10.1166/jnn.2010.2256.
Silver nanopatterns were fabricated using a nanoimprint and lift-off process using silver nano-ink. Particle-based silver nano-ink was used to fabricate metal patterns below 100 nm in a lift-off process without the undercut shape of polymer patterns typically required in a conventional lift-off process using evaporated metal. The silver film made by spin-coating the silver nano-ink and removing the solvent using PDMS, has a low density compared to evaporated metal film; hence, unnecessary nano-ink that is not part of the pattern area is easily eliminated during the lift-off process. Using the proposed patterning process, patterns defined on a stamp were successfully transferred to the nano-ink through nanoimprinted polymer patterns on a four-inch Si wafer. Compared to other metal patterning methods that involve lift-off processes, the proposed metal patterning process is a simple and cost-effective process capable of fabricating the micro- and nano-sized metal patterns due to its low operating temperature and one-step polymer patterning process by nanoimprinting.
使用银纳米墨水通过纳米压印和剥离工艺制备银纳米图案。基于颗粒的银纳米墨水用于在剥离工艺中制造低于100nm的金属图案，而无需传统的使用蒸发金属的剥离工艺中通常所需的聚合物图案的底切形状。通过旋涂银纳米墨水并使用聚二甲基硅氧烷去除溶剂制成的银膜，与蒸发金属膜相比密度较低；因此，在剥离过程中，图案区域以外的多余纳米墨水很容易被去除。使用所提出的图案化工艺，通过四英寸硅晶片上的纳米压印聚合物图案，成功地将印章上定义的图案转移到纳米墨水上。与其他涉及剥离工艺的金属图案化方法相比，所提出的金属图案化工艺是一种简单且具有成本效益的工艺，由于其较低的操作温度和通过纳米压印的一步聚合物图案化工艺，能够制造微米和纳米尺寸的金属图案。
