You Joo Hyung, Lee Se Han, You Chan Ho, Yu Yun Seop, Kim Tae Whan
Nano Quantum Electronic Laboratory, Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791, Korea.
J Nanosci Nanotechnol. 2010 May;10(5):3609-13. doi: 10.1166/jnn.2010.2273.
A compact model of the current-voltage (I-V) characteristics for the Si nanowire field effect transistor (FET) taking into account dependence of the analytical electrical properties on the diameter and the concentration of the Si nanowire of the FETs with a Schottky metal-semiconductor contact has been proposed. I-V characteristics of the nanowire FETs were analytically calculated by using a quantum drift-diffusion current transport model taking into account an equivalent circuit together with the quantum effect of the Si nanowires and a Schottky model at Schottky barriers. The material parameters dependent on different diameters and concentrations of the Si nanowire were numerically estimated from the physical properties of the Si nanowire. The threshold voltage, the mobility, and the doping density of the Si nanowire and the Schottky barrier height at a metal-Si nanowire heterointerface in the nanowire FET were estimated by using the theoretical model.
提出了一种考虑肖特基金属-半导体接触的硅纳米线场效应晶体管(FET)电流-电压(I-V)特性的紧凑模型,该模型考虑了分析电学性质对FET硅纳米线直径和浓度的依赖性。通过使用量子漂移-扩散电流传输模型,结合硅纳米线的量子效应和肖特基势垒处的肖特基模型,对纳米线FET的I-V特性进行了解析计算。根据硅纳米线的物理性质,对依赖于不同直径和浓度的硅纳米线的材料参数进行了数值估计。利用该理论模型估算了纳米线FET中硅纳米线的阈值电压、迁移率、掺杂密度以及金属-硅纳米线异质界面处的肖特基势垒高度。