Department of Materials Science and Engineering, Stanford University Geballe Laboratory for Advanced Materials, 476 Lomita Mall, Stanford, CA 94305-4045, USA.
Small. 2010 May 7;6(9):1032-7. doi: 10.1002/smll.200901764.
Nanoporous Si(111) substrates are used to study the effects of Au catalyst coarsening on the nucleation of vapor-liquid-solid-synthesized epitaxial Ge nanowires (NWs) at temperatures less than 400 degrees C. Porous Si substrates, with greater effective interparticle separations for Au surface diffusion than nonporous Si, inhibit catalyst coarsening and agglomeration prior to NW nucleation. This greatly reduces the variation in wire diameter and length and increases the yield compared to nucleation on identically prepared nonporous Si substrates.
纳米多孔硅(111)衬底用于研究在低于 400°C 的温度下,金催化剂粗化对气相液固合成外延锗纳米线(NWs)成核的影响。多孔硅衬底的 Au 表面扩散有效粒子间分离大于非多孔硅衬底,在 NW 成核之前抑制催化剂粗化和团聚。与在相同制备的非多孔硅衬底上成核相比,这大大降低了线材直径和长度的变化,并提高了产率。