Jozef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia.
Phys Rev Lett. 2010 Apr 16;104(15):156804. doi: 10.1103/PhysRevLett.104.156804. Epub 2010 Apr 15.
We present spectroscopic measurements on the first example of a chemically electron-doped metal-DNA complex. We show that a doping level as high as the stoichiometric limit of one electron per base pair can be achieved. The doped unpaired electrons occupy lowest unoccupied molecular orbital levels of the nucleobases as detected with electron spin resonance and x-ray absorption near edge structure measurements. Delocalization and strong correlations between the unpaired electrons are evident from a temperature-independent spin susceptibility and a microwave conductivity above 100 K.
我们展示了首例化学电子掺杂金属-DNA 复合物的光谱测量结果。我们表明，掺杂水平可以高达每个碱基对一个电子的化学计量限制。用电子自旋共振和 X 射线吸收近边结构测量表明，掺杂的未配对电子占据了核碱基的最低未占据分子轨道能级。从与温度无关的自旋磁化率和高于 100 K 的微波电导率可以看出，未配对电子的离域和强相关性是明显的。
