Ohlidal I, Schmidt E, Libezny M
Appl Opt. 1990 Feb 1;29(4):593-8. doi: 10.1364/AO.29.000593.
A new ellipsometric method for the complete unambiguous optical characterization of double layers consisting of two strongly absorbing thin films placed on a nonabsorbing substrate is described in this paper. The method utilizes simultaneous interpretation of ellipsometric parameters measured for light reflected and transmitted by the ambient side and the substrate side of the two samples of the double layer investigated. These samples must have different thicknesses of both strongly absorbing films (at least the thickness of one of the two films). The method was successfully employed for analyzing the double layers formed by gold and chromium films at a wavelength of 632.8 nm.
本文介绍了一种新的椭偏测量方法，用于对由放置在非吸收性衬底上的两个强吸收薄膜组成的双层进行完整、明确的光学表征。该方法利用对双层的两个样品从环境侧和衬底侧反射和透射的光所测量的椭偏参数进行同时解释。这些样品的两个强吸收薄膜必须具有不同的厚度（至少两个薄膜之一的厚度不同）。该方法已成功用于分析在波长632.8nm下由金膜和铬膜形成的双层。
