School of Electronic Science and Applied Physics, Hefei University of Technology, Hefei Anhui, 230009, People's Republic of China.
Nanotechnology. 2010 Jul 16;21(28):285206. doi: 10.1088/0957-4484/21/28/285206. Epub 2010 Jun 28.
Coaxial ZnSe/Si nanocables were successfully produced by a simple two-step growth method. ZnSe nanowire cores were first synthesized by thermal evaporation and then followed by the chemical vapor deposition (CVD) growth of Si shells. The former have a cubic single-crystal structure with a longitudinal direction of [Formula: see text], while the latter are polycrystalline and composed of a large number of Si crystal grains with dominantly (111) surfaces. Controlled p-type doping to the Si shells was implemented by B diffusion after the shell growth. Electrical measurements on the Si shells demonstrated that the shell conductivity could be tuned in a wide range of eight orders of magnitude by adjusting the B concentration, and a hole mobility of 11.7 cm(2) V( - 1) s( - 1) and a hole concentration of 2 x 10(15) cm( - 3) were revealed for the modestly doped Si shells. The ZnSe/Si core/shell nanocables have great potential in nano-optoelectronic applications.
同轴 ZnSe/Si 纳米电缆通过简单的两步生长法成功制备。ZnSe 纳米线核首先通过热蒸发合成,然后通过化学气相沉积(CVD)生长 Si 壳。前者具有立方单晶结构,其[Formula: see text]的纵向方向,而后者是多晶的,由大量具有主导(111)表面的 Si 晶粒组成。在壳生长后,通过 B 扩散对 Si 壳进行了受控的 p 型掺杂。对 Si 壳的电测量表明,通过调整 B 浓度,可以在 8 个数量级的宽范围内调节壳的电导率,对于适度掺杂的 Si 壳,空穴迁移率为 11.7 cm(2) V( - 1) s( - 1),空穴浓度为 2 x 10(15) cm( - 3)。ZnSe/Si 核/壳纳米电缆在纳米光电子应用中具有巨大的潜力。