Ege University, School of Dentistry, Department of Paediatric Dentistry, Izmir, Turkey.
Eur J Paediatr Dent. 2010 Jun;11(2):93-6.
The aim of the study was to evaluate the effect of saliva contamination and compare the microleakage of three different pit-and-fissure sealants namely, Helioseal F, Enamel Loc and Fuji VII.
Sixty recently extracted sound third molars were randomly assigned to three groups for three different sealant materials (n=20). Each sealant group was then randomly divided into two as uncontaminated (n=10) and saliva contaminated (n=10) prior to sealant placement. The samples were thermocycled in water for 500 cycles between 5 and 55 degrees C with a dwell time of 30 s and immersed in 1% methylene-blue for 24 h. The samples were sectioned and scored on a 3 point rating scale using a light microscope.
Among both contaminated and uncontaminated groups Helioseal F showed statistically significantly less microleakage compared to Enamel Loc and Fuji VII groups (p<0.05). There was no statistically significant difference between Enamel Loc and Fuji VII in both absence and presence of saliva contamination (p>0.05).
The results were analysed using Kruskal Wallis test while study groups were compared with Mann-Whitney test for statistically significant differences at 5% significance level.
Under both uncontaminated and saliva contaminated conditions, the light-cured resin-based pit-and-fissure sealant Helioseal F yielded lower microleakage scores compared to Enamel Loc and Fuji VII.
本研究旨在评估唾液污染的影响,并比较三种不同窝沟封闭剂(Helioseal F、Enamel Loc 和 Fuji VII)的微渗漏情况。
从最近拔除的 60 颗健康第三磨牙中随机分为三组,分别使用三种不同的封闭剂材料(n=20)。每组再随机分为两组,一组为未污染组(n=10),另一组为唾液污染组(n=10),然后再进行封闭剂放置。将样本在 5 至 55°C 之间进行 500 次热循环,停留时间为 30s,然后在 1%亚甲基蓝中浸泡 24 小时。使用显微镜对样本进行 3 分制评分。
在污染和未污染组中,Helioseal F 与 Enamel Loc 和 Fuji VII 组相比,微渗漏明显减少(p<0.05)。在存在和不存在唾液污染的情况下,Enamel Loc 和 Fuji VII 之间没有统计学上的显著差异(p>0.05)。
采用 Kruskal Wallis 检验分析结果,在 5%显著水平下,采用 Mann-Whitney 检验比较研究组间的统计学差异。
在未污染和唾液污染条件下,光固化树脂基窝沟封闭剂 Helioseal F 的微渗漏评分均低于 Enamel Loc 和 Fuji VII。