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弱吸收介电薄膜的红外光学常数测定

Infrared optical constant determination of weakly absorbing dielectric thin films.

作者信息

Mouchart J, Begel J, Clément C

出版信息

Appl Opt. 1992 Mar 1;31(7):885-97. doi: 10.1364/AO.31.000885.

Abstract

Simple approximate relations are given for the reflectance of a weakly absorbing dielectric layer deposited as a quarter wave or a half-wave upon transparent and metallic substrates. These approximated relations are used in the infrared to calculate the optical constants n and k and the inhomogeneity partial differentialn of the index n of a material deposited as a thin film. A high degree of accuracy is sought for k. Two examples are given for ZnS and ThF(4) in the 3-11-microm spectral range.

摘要

给出了在透明和金属衬底上沉积为四分之一波长或半波长的弱吸收介电层的反射率的简单近似关系。这些近似关系用于红外波段,以计算作为薄膜沉积的材料的光学常数n和k以及折射率n的不均匀性偏导数∂n。对k的精度要求较高。给出了在3 - 11微米光谱范围内硫化锌(ZnS)和氟化钍(ThF₄)的两个例子。

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