School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN 47907, USA.
Nanotechnology. 2010 Sep 24;21(38):385203. doi: 10.1088/0957-4484/21/38/385203. Epub 2010 Aug 27.
DC and intrinsic low-frequency noise properties of p-channel depletion-mode carbon nanotube field effect transistors (CNT-FETs) are investigated. To characterize the intrinsic noise properties, a thin atomic layer deposited (ALD) HfO(2) gate dielectric is used as a passivation layer to isolate CNT-FETs from environmental factors. The ALD HfO(2) gate dielectric in these high-performance top-gated devices is instrumental in attaining hysteresis-free current-voltage characteristics and minimizes low-frequency noise. Under small drain-source voltage, the carriers in the CNT channel are modulated by the gate electrode and the intrinsic 1/f noise is found to be correlated with charge trapping/detrapping from the oxide substrate as expected. When thermionic emission is the dominant carrier transport mechanism in CNT-FETs under large drain-source voltages, the excess 1/f noise is attributed to the noise stemming from metal-CNT Schottky barrier contacts as revealed by the measurements.
本文研究了 p 沟道耗尽模式碳纳米管场效应晶体管(CNT-FET)的直流(DC)和固有低频噪声特性。为了表征固有噪声特性,使用薄的原子层沉积(ALD)HfO2栅介质作为钝化层将 CNT-FET 与环境因素隔离开来。在这些高性能顶栅器件中,ALD HfO2栅介质有助于获得无迟滞的电流-电压特性并最大限度地降低低频噪声。在小漏源电压下,栅电极调制 CNT 沟道中的载流子,固有 1/f 噪声与预期的从氧化物衬底的电荷俘获/释放相关。当热电子发射是 CNT-FET 中大漏源电压下的主要载流子输运机制时,过量 1/f 噪声归因于金属-CNT 肖特基势垒接触引起的噪声,这是通过测量揭示的。