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碳纳米管晶体管钝化中的 DC 建模和闪烁噪声源。

DC modeling and the source of flicker noise in passivated carbon nanotube transistors.

机构信息

School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN 47907, USA.

出版信息

Nanotechnology. 2010 Sep 24;21(38):385203. doi: 10.1088/0957-4484/21/38/385203. Epub 2010 Aug 27.

Abstract

DC and intrinsic low-frequency noise properties of p-channel depletion-mode carbon nanotube field effect transistors (CNT-FETs) are investigated. To characterize the intrinsic noise properties, a thin atomic layer deposited (ALD) HfO(2) gate dielectric is used as a passivation layer to isolate CNT-FETs from environmental factors. The ALD HfO(2) gate dielectric in these high-performance top-gated devices is instrumental in attaining hysteresis-free current-voltage characteristics and minimizes low-frequency noise. Under small drain-source voltage, the carriers in the CNT channel are modulated by the gate electrode and the intrinsic 1/f noise is found to be correlated with charge trapping/detrapping from the oxide substrate as expected. When thermionic emission is the dominant carrier transport mechanism in CNT-FETs under large drain-source voltages, the excess 1/f noise is attributed to the noise stemming from metal-CNT Schottky barrier contacts as revealed by the measurements.

摘要

本文研究了 p 沟道耗尽模式碳纳米管场效应晶体管(CNT-FET)的直流(DC)和固有低频噪声特性。为了表征固有噪声特性,使用薄的原子层沉积(ALD)HfO2栅介质作为钝化层将 CNT-FET 与环境因素隔离开来。在这些高性能顶栅器件中,ALD HfO2栅介质有助于获得无迟滞的电流-电压特性并最大限度地降低低频噪声。在小漏源电压下,栅电极调制 CNT 沟道中的载流子,固有 1/f 噪声与预期的从氧化物衬底的电荷俘获/释放相关。当热电子发射是 CNT-FET 中大漏源电压下的主要载流子输运机制时,过量 1/f 噪声归因于金属-CNT 肖特基势垒接触引起的噪声,这是通过测量揭示的。

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