Physical optics modeling in soft-x-ray projection lithography.
作者信息
Sweatt W C, Lawrence G N
出版信息
Appl Opt. 1993 Dec 1;32(34):6945-51. doi: 10.1364/AO.32.006945.
PMID:20856550
Abstract
We develop a diffraction-based tool that can predict the image quality in projection lithography systems. The effects of partial coherence and source variations and imaging defects in both the condenser and the camera optics can all be determined.
摘要
Zotero 插件