Ekberg M, Nikolajeff F, Larsson M, Hård S
Appl Opt. 1994 Jan 1;33(1):103-7. doi: 10.1364/AO.33.000103.
Proximity-compensated, as well as uncompensated, blazed transmission gratings with periods of 4, 8, and 16 µm were manufactured with direct-writing, electron-beam lithography in positive resist. The compensated gratings performed better than the uncompensated ones. For the 4-µm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The compensation was made by repeated convolutions in the spatial domain with the electron-beam point spread function. We determined this function by retrieving the phase from the measured diffraction pattern of the uncompensated gratings.
采用电子束光刻技术在正性光刻胶中进行直写，制造出了周期为4μm、8μm和16μm的接近补偿型以及未补偿型闪耀透射光栅。补偿光栅的性能优于未补偿光栅。对于4μm的补偿光栅，测得的衍射效率为67%。未补偿光栅的衍射效率为35%。通过在空间域中与电子束点扩散函数进行重复卷积来实现补偿。我们通过从未补偿光栅的测量衍射图样中恢复相位来确定该函数。
