Vardimon Alexander D, Robbins Daniel, Brosh Tamar
Professor and head, Department of Orthodontics, Maurice and Gabriela Goldschleger School of Dental Medicine, Tel Aviv University, Tel Aviv, Israel.
Private practice, Mexico City, Mexico.
Am J Orthod Dentofacial Orthop. 2010 Oct;138(4):399-409. doi: 10.1016/j.ajodo.2008.11.027.
The Invisalign (Align Technology, Santa Clara, Calif) force delivery system has not been investigated. Since forces are related to the strains developed on the aligner surface, the behavior of the maxillary incisor and premolar von Mises strains (IVM, PVM) were studied during biweekly wear of an aligner.
Maxillary aligners (n = 61) were examined from 3 patients requiring maxillary incisor retraction and stationary anchored premolars. Two series of maxillary aligners were manufactured. Series 1 was worn by the patient, and series 2 served for in-vivo measurements with 2 strain gauge rosettes bonded to each aligner on the vestibular sides of the incisor and the premolar. Measurements were taken at days 1, 2, 9, and 15.
All aligners demonstrated a peak IVM strain at day 1 (P<0.001); it then decreased at day 2 and plateaued through day 15. No anchorage loss was found in 2 patients (IVM ≥ PVM), and a minute loss was evident in 1 patient (PVM>IVM).
Each aligner should be worn close to 24 hours in the first 2 days, with the time subsequently reduced (remaining 12 days). Final aligners should be thicker or worn for longer period (eg, 3 weeks). In spite of the inherent anchorage property of the aligner, attachment reinforcement should be considered in demanding anchorage requirements.
隐适美(Align Technology公司,加利福尼亚州圣克拉拉)矫治力传递系统尚未得到研究。由于力与矫治器表面产生的应变相关,因此在每两周更换一副矫治器的过程中,对上颌切牙和前磨牙的冯·米塞斯应变(IVM,PVM)行为进行了研究。
对3例需要内收上颌切牙并使前磨牙保持稳定的患者的上颌矫治器(n = 61)进行了检查。制作了两副上颌矫治器。第1副由患者佩戴,第2副用于体内测量,在每副矫治器的切牙和前磨牙的前庭侧粘贴2个应变片式应变计。在第1、2、9和15天进行测量。
所有矫治器在第1天均表现出IVM应变峰值(P<0.001);然后在第2天下降,并在第15天趋于平稳。2例患者未发现支抗丧失(IVM≥PVM),1例患者有轻微支抗丧失(PVM>IVM)。
每副矫治器在前2天应佩戴接近24小时,随后佩戴时间可减少(剩余12天)。最后一副矫治器应更厚或佩戴更长时间(如3周)。尽管矫治器具有固有的支抗特性,但在支抗要求较高的情况下,应考虑加强固位。