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紫外线诱导牛晶状体上皮细胞的DNA损伤与修复。

Ultraviolet light induced DNA damage and repair in bovine lens epithelial cells.

作者信息

Kleiman N J, Wang R R, Spector A

机构信息

Department of Ophthalmology, College of Physicians and Surgeons, Columbia University, New York, NY 10032.

出版信息

Curr Eye Res. 1990 Dec;9(12):1185-93. doi: 10.3109/02713689009003475.

Abstract

DNA damage caused by UV-B and UV-A irradiation and the rate of repair of such damage was quantitated in bovine lens epithelial cell cultures using a modified alkaline elution methodology. Two enzymes, bacteriophage T4 endonuclease V, which cleaves at the site of pyrimidine dimers, and E. coli endonuclease III, which cleaves at the site of thymine glycols, were utilized. Pyrimidine dimers were not detected after UV-A irradiation of lens cultures with up to 400 J/m2. In contrast, after exposure to as little as 2 J/m2 of UV-B irradiation, large numbers of pyrimidine dimers were observed. At higher fluences, thymine glycols were also found. Significant levels of DNA-DNA crosslinking were suggested by reduced rates of elution of DNA from cells treated with both UV-B irradiation and H2O2 in comparison to treatment with H2O2 alone. Protein-DNA crosslinks, in contrast, were not observed. The rate of repair of UV-B induced DNA damage was quantitated by harvesting cells at various times after the UV-B exposure. Single-strand breaks were never observed immediately after UV-B exposure but appeared later during the repair phase. In contrast to the repair of H2O2 induced DNA damage, which is largely completed within 30 min of exposure, more than 50% of the UV-B light induced DNA damage remained unrepaired five hours after exposure. This difference between the rate of repair of H2O2 and UV-B induced DNA damage could provide valuable insights into the nature of DNA damaging agents in the lens environment and may reflect underlying differences in the potential for epithelial cell DNA mutation in response to various DNA damaging insults.

摘要

采用改良的碱性洗脱方法,对牛晶状体上皮细胞培养物中由UV - B和UV - A辐射引起的DNA损伤及其修复速率进行了定量分析。使用了两种酶,一种是在嘧啶二聚体位点切割的噬菌体T4内切核酸酶V,另一种是在胸腺嘧啶乙二醇位点切割的大肠杆菌内切核酸酶III。用高达400 J/m2的UV - A辐射晶状体培养物后,未检测到嘧啶二聚体。相反,在暴露于低至2 J/m2的UV - B辐射后,观察到大量嘧啶二聚体。在更高的通量下,还发现了胸腺嘧啶乙二醇。与单独用H2O2处理相比,用UV - B辐射和H2O2处理的细胞中DNA的洗脱速率降低,提示存在显著水平的DNA - DNA交联。相比之下,未观察到蛋白质 - DNA交联。通过在UV - B暴露后的不同时间收获细胞,对UV - B诱导的DNA损伤的修复速率进行了定量分析。UV - B暴露后立即从未观察到单链断裂,但在修复阶段后期出现。与H2O2诱导的DNA损伤的修复不同,后者在暴露后30分钟内基本完成,而UV - B光诱导的DNA损伤在暴露后5小时仍有超过50%未修复。H2O2和UV - B诱导的DNA损伤修复速率的这种差异,可能为晶状体环境中DNA损伤剂的性质提供有价值的见解,并可能反映上皮细胞DNA对各种DNA损伤刺激发生突变的潜在差异。

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