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UV-B 诱导的小鼠晶状体中的 DNA 损伤与修复。

UV-B-induced DNA damage and repair in the mouse lens.

机构信息

Department of Ophthalmology and Visual Sciences, Washington University School of Medicine, Saint Louis, Missouri.

出版信息

Invest Ophthalmol Vis Sci. 2013 Oct 17;54(10):6789-97. doi: 10.1167/iovs.13-12644.

Abstract

PURPOSE

Epidemiologic studies have linked UV-B exposure to development of cortical cataracts, but the underlying molecular mechanism(s) is unresolved. Here, we used a mouse model to examine the nature and distribution of DNA photolesions produced by ocular UV-B irradiation.

METHODS

Anesthetized mice, eye globes, or isolated lenses were exposed to UV-B. Antibodies specific for 6-4 photoproducts (6-4 PPs) or cyclobutane pyrimidine dimers (CPDs) were used to visualize DNA adducts.

RESULTS

Illumination of intact globes with UV-B-induced 6-4 PP and CPD formation in cells of the cornea, anterior iris, and central lens epithelium. Photolesions were not detected in retina or lens cells situated in the shadow of the iris. Photolesions in lens epithelial cells were produced with radiant exposures significantly below the minimal erythemal dose. Lens epithelial cells rapidly repaired 6-4 PPs, but CPD levels did not markedly diminish, even over extended postirradiation recovery periods in vitro or in vivo. The repair of 6-4 PPs did not depend on the proliferative activity of the epithelial cells, since the repair rate in the mitotically-active germinative zone (GZ) was indistinguishable from that of quiescent cells in the central epithelium.

CONCLUSIONS

Even relatively modest exposures to UV-B produced 6-4 PP and CPD photolesions in lens epithelial cells. Cyclobutane pyrimidine dimer lesions were particularly prevalent and were repaired slowly if at all. Studies on sun-exposed skin have established a causal connection between photolesions and so-called UV-signature mutations. If similar mechanisms apply in the lens, it suggests that somatic mutations in lens epithelial cells may contribute to the development of cortical cataracts.

摘要

目的

流行病学研究将 UV-B 暴露与皮质性白内障的发展联系起来,但潜在的分子机制尚未解决。在这里,我们使用小鼠模型来研究眼部 UV-B 照射产生的 DNA 光损伤的性质和分布。

方法

将麻醉的小鼠、眼球或分离的晶状体暴露于 UV-B 下。使用针对 6-4 光产物(6-4 PPs)或环丁烷嘧啶二聚体(CPDs)的特异性抗体来可视化 DNA 加合物。

结果

用 UV-B 照射完整的眼球,在角膜、前虹膜和中央晶状体上皮细胞中诱导 6-4 PP 和 CPD 的形成。在视网膜或位于虹膜阴影下的晶状体细胞中未检测到光损伤。在晶状体上皮细胞中产生光损伤所需的辐射暴露明显低于最小红斑剂量。晶状体上皮细胞迅速修复 6-4 PPs,但 CPD 水平即使在体外或体内延长的辐射后恢复期间也没有明显降低。6-4 PPs 的修复并不依赖于上皮细胞的增殖活性,因为有丝分裂活跃的生发区(GZ)中的修复率与中央上皮中的静止细胞无法区分。

结论

即使是相对适度的 UV-B 暴露也会在晶状体上皮细胞中产生 6-4 PP 和 CPD 光损伤。环丁烷嘧啶二聚体损伤特别普遍,如果有修复的话也非常缓慢。对暴露于阳光的皮肤的研究已经确立了光损伤与所谓的“UV 特征性突变”之间的因果关系。如果类似的机制适用于晶状体,这表明晶状体上皮细胞中的体细胞突变可能导致皮质性白内障的发展。

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