Voelkel Reinhard, Vogler Uwe, Bich Andreas, Pernet Pascal, Weible Kenneth J, Hornung Michael, Zoberbier Ralph, Cullmann Elmar, Stuerzebecher Lorenz, Harzendorf Torsten, Zeitner Uwe D
SUSS MicroOptics SA, Jaquet-Droz 7, 2000 Neuchâtel, Switzerland.
Opt Express. 2010 Sep 27;18(20):20968-78. doi: 10.1364/OE.18.020968.
A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography.
提出了一种用于掩膜对准光刻的新型照明系统。该照明系统使用两个基于微透镜的连续柯勒积分器。第二个柯勒积分器位于第一个的傅里叶平面内。这种新型照明系统将照明光与光源解耦，并提供出色的光辐照度均匀性和角谱。空间滤波允许自由塑造角谱，以最小化接触式光刻和接近式光刻中的衍射效应。远心照明以及精确控制照明光的能力使得在掩膜对准光刻中能够引入分辨率增强技术（RET），如定制照明、光学邻近校正（OPC）和源掩膜优化（SMO）。
