Stuerzebecher Lorenz, Harzendorf Torsten, Vogler Uwe, Zeitner Uwe D, Voelkel Reinhard
Fraunhofer Institut für Angewandte Optik und Feinmechanik IOF, Jena, Germany.
Opt Express. 2010 Sep 13;18(19):19485-94. doi: 10.1364/OE.18.019485.
The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.
塔尔博特效应通过掩膜对准器中的接近光刻用于周期性微结构的微制造。一种称为MO曝光光学系统的新型照明系统，可以控制有效光源形状，从而控制照明光的角谱。针孔阵列光掩模用于通过自成像产生周期性高分辨率衍射图案。它们在其衍射图案中创建有效光源几何形状的缩小图像，并将其印制到光刻胶上。所提出的方法具有高度的灵活性，并且在大的接近间隙下具有亚微米分辨率。已经生成并展示了各种周期性结构。
