Université Libre de Bruxelles, Faculté des Sciences, Chimie Analytique et chimie des interfaces, cp 255, Bld du Triomphe 2, B-1050 Brussels, Belgium.
Langmuir. 2010 Nov 2;26(21):16503-9. doi: 10.1021/la101380j.
The transformation of a poly(tetrafluoroethylene) (PTFE) hydrophobic surface into a superhydrophobic one using a low pressure RF plasma is explored using optical emission spectrometry (OES), X-ray photoelectron spectroscopy (XPS), water contact angle (WCA) measurements, mass measurements, and atomic force microscopy (AFM). It is shown that the increase in contact angle is due to an increase of roughness provoked by a chemical etching of the surface. We propose a molecular mechanism for etching that requires the simultaneous presence of atomic oxygen and negatively charged species (electrons) at the PTFE surface.
使用低压射频等离子体将聚四氟乙烯（PTFE）疏水表面转化为超疏水表面，使用光学发射光谱（OES）、X 射线光电子能谱（XPS）、水接触角（WCA）测量、质量测量和原子力显微镜（AFM）进行了探索。结果表明，接触角的增加是由于表面化学蚀刻引起的粗糙度增加所致。我们提出了一种蚀刻的分子机制，该机制需要在 PTFE 表面同时存在原子氧和带负电荷的物质（电子）。
