Radiation Research Division for Industry and Environment, Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute, Jeongeup-si, Jeollabuk-do 580-185, Republic of Korea.
ACS Appl Mater Interfaces. 2011 Aug;3(8):2988-93. doi: 10.1021/am200464a. Epub 2011 Aug 3.
A simple and controllable one-step method to fabricate superhydrophobic surfaces on poly(tetrafluoroethylene) (PTFE) films is developed on the base of electron irradiation. When the thickness of PTFE films is higher than the penetration depth of electron beams, electrical charging occurs at the surface of the films because of the imbalance between the accumulation of incident electrons and the emission of secondary electrons. Local inhomogeneity of charge distribution due to this electrical charging results in the nonuniform decomposition of PTFE molecular bonds. As electron fluence increases, surface morphology and surface roughness of the films are dramatically changed. An extremely rough surface with micrometer-sized pores is produced on the surface of PTFE films by electron irradiation at a fluence higher than 2.5 × 10(17) cm(-2).Because of high surface roughness, the irradiated PTFE films exhibit superhydrophobic property with a water contact angle (CA) greater than 150° at fluences ranging from 4 × 10(17) to 1 × 10(18) cm(-2). The surface morphology and corresponding water CA can be controlled by simply changing the electron fluence. This electron irradiation method can be applicable to the fabrication of superhydrophobic surfaces using other low-surface-energy materials including various fluoropolymers.
一种简单可控的一步法,可在聚四氟乙烯(PTFE)薄膜上制备超疏水表面,该方法基于电子辐照。当 PTFE 薄膜的厚度高于电子束的穿透深度时,由于入射电子的积累与二次电子的发射之间的不平衡,会在薄膜表面发生电荷积累。这种电荷积累导致的电荷分布不均匀会导致 PTFE 分子键的非均匀分解。随着电子剂量的增加,薄膜的表面形貌和表面粗糙度会发生显著变化。在电子剂量高于 2.5×10(17)cm(-2)时,电子辐照会在 PTFE 薄膜表面产生具有微米级孔径的极粗糙表面。由于高表面粗糙度,辐照后的 PTFE 薄膜在电子剂量为 4×10(17)至 1×10(18)cm(-2)范围内表现出超疏水性能,水接触角(CA)大于 150°。通过简单改变电子剂量可以控制表面形貌和相应的水 CA。这种电子辐照方法可适用于其他低表面能材料(包括各种氟聚合物)的超疏水表面的制备。