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超疏水多尺度结构上的电润湿和液滴刺穿实验。

Electrowetting and droplet impalement experiments on superhydrophobic multiscale structures.

机构信息

Institut d'Electronique, de Microélectronique et de Nanotechnologies (IEMN), UMR CNRS 8520, F-59652 Villeneuve d'Ascq, France.

出版信息

Faraday Discuss. 2010;146:125-139; discussion 195-215, 395-403. doi: 10.1039/b925544c.

Abstract

The reversible actuation of droplets on superhydrophobic surfaces under ambient conditions is currently an important field of research due to its potential applicability in microfluidic lab-on-a-chip devices. We have recently shown that Si-nanowire (NW) surfaces allow for reversible actuation provided that the surface structures show certain characteristics. In particular it appears that, for such surfaces, the presence of structures with multiple specific length scales is indeed needed to have a robust reversibility of contact angle changes. Here we report on electrowetting (EW) and impalement experiments on double-scale structured surfaces prepared by a combination of silicon micropillars prepared by an association of optical lithography and silicon etching, and nanowire growth on top of these surfaces. We show that while micropillar surfaces have a low impalement threshold and irreversible EW behaviour, a surface with double-scale texture can show both a very high resistance to impalement and a limited reversibility under EW, provided that the roughness of the micro-scale is large enough--i.e. that the pillars are tall enough. The optimal performance is obtained for a space between pillars that is comparable to the height of the nanostructure.

摘要

在环境条件下,超疏水表面上液滴的可逆驱动是当前一个重要的研究领域,因为它在微流控芯片设备中有潜在的应用。我们最近表明,只要表面结构具有某些特征,硅纳米线(NW)表面就允许进行可逆驱动。特别是,对于这种表面,确实需要具有多个特定长度尺度的结构存在,才能使接触角变化具有稳健的可逆性。在这里,我们报告了在通过光学光刻和硅蚀刻结合制备的硅微柱以及在这些表面上生长的纳米线的双重结构表面上进行的电润湿(EW)和刺穿实验。我们表明,虽然微柱表面具有低的刺穿阈值和不可逆的 EW 行为,但具有双重纹理的表面在 EW 下可以表现出非常高的抗刺穿性和有限的可逆性,前提是微尺度的粗糙度足够大,即柱子足够高。对于与纳米结构高度相当的柱间距,可获得最佳性能。

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