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光活性聚合物的退火和共混对其晶体结构的影响。

Influence of annealing and blending of photoactive polymers on their crystalline structure.

机构信息

Physik-Department E13, Lehrstuhl für Funktionelle Materialien, Technische Universität München, James-Franck-Str. 1, 85747 Garching, Germany.

出版信息

J Phys Chem B. 2010 Dec 2;114(47):15451-8. doi: 10.1021/jp106972s. Epub 2010 Nov 4.

Abstract

Thin photoactive polymer films of poly(3-octylthiophene-2,5-diyl) (P3OT) and poly(2,5-di(hexyloxy)cyanoterephthalylidene) (CN-PPV) are investigated. With X-ray reflectivity measurements, a linear concentration-thickness dependence is found for both polymers and the molecular weight of CN-PPV is determined from this concentration-thickness dependence. Based on the molecular weights, the critical blending ratio is determined. Grazing incidence wide-angle X-ray scattering (GIWAXS) is used to probe the crystallinity of thin films and to determine characteristic length scales of the crystalline structure. Moreover, the orientation of the crystalline parts regarding the substrate of both the homopolymer and the blended films is probed with GIWAXS. Temperature annealing is found to improve the crystallization for both homopolymers. In addition, reorientation of the predominant crystalline structures takes place. Blending both polymers reduces or even suppresses the crystallization during spin coating as well as temperature annealing. Absorption measurements complement the structural investigations.

摘要

研究了聚(3-辛基噻吩-2,5-二基)(P3OT)和聚(2,5-二(己氧基)氰基对苯二甲酰亚胺)(CN-PPV)的薄光活性聚合物膜。通过 X 射线反射率测量,发现两种聚合物都具有线性浓度-厚度依赖性,并且可以从该浓度-厚度依赖性确定 CN-PPV 的分子量。基于分子量,确定了临界共混比。掠入射广角 X 射线散射(GIWAXS)用于探测薄膜的结晶度,并确定晶体结构的特征长度尺度。此外,还通过 GIWAXS 探测了同聚物和共混膜的晶体部分相对于基底的取向。发现温度退火可以提高两种均聚物的结晶度。此外,还发生了主要晶体结构的重新取向。共混两种聚合物会在旋涂和温度退火过程中减少甚至抑制结晶。吸收测量补充了结构研究。

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