School of Chemistry, University of Bristol, Cantock's Close, Bristol BS8 1TS, United Kingdom.
J Am Chem Soc. 2010 Dec 1;132(47):16855-61. doi: 10.1021/ja106149g. Epub 2010 Nov 4.
A novel approach to tuning electrochemical rectification using 2D assemblies of quantum dots (QDs) is presented. Asymmetric enhancement of the oxidation and reduction currents in the presence of the Fe(CN)(6)(3-/4-) redox couple is observed upon adsorption of QDs at thiol-modified Au electrodes. The extent of the electrochemical rectification is dependent on the average QD size. A molecular blocking layer is generated by self-assembling 11-mercaptoundecanoic acid (MUA) and an ultrathin film of poly(diallyldimethylammonium chloride) (PDADMAC) on the electrode. The polycationic film allows the electrostatic adsorption of 3-mercaptopropionic acid (MPA)-stabilized CdTe QDs, generating 2D assemblies with approximately 0.4% coverage. The QD adsorption activates a fast charge transfer across the blocking layer in which the reduction process is more strongly enhanced than the oxidation reaction. The partial electrochemical rectification is rationalized in terms of the relative position of the valence (VB) and conduction band (CB) edges with respect to the redox Fermi energy (ε(redox)). Quantitative analysis of the exchange current density obtained from electrochemical impedance spectroscopy demonstrates that the enhancement of charge transport across the molecular barrier is strongly dependent on the position of the QD valence band edge relative to ε(redox). The average electron tunneling rate constant through the QD assemblies is estimated on the basis of the Gerischer model for electron transfer.
本文提出了一种利用二维量子点(QD)组装来调谐电化学整流的新方法。在巯基修饰的 Au 电极上吸附 QD 后,观察到在 Fe(CN)(6)(3-/4-)氧化还原对存在的情况下,氧化和还原电流的不对称增强。电化学整流的程度取决于平均 QD 尺寸。通过自组装 11-巯基十一酸(MUA)和聚二烯丙基二甲基氯化铵(PDADMAC)的超薄膜在电极上生成分子阻挡层。聚阳离子膜允许静电吸附 3-巯基丙酸(MPA)稳定的 CdTe QD,生成具有约 0.4%覆盖率的二维组装体。QD 吸附在阻挡层中激活快速电荷转移,其中还原过程比氧化反应得到更强烈的增强。部分电化学整流可以根据价带(VB)和导带(CB)边缘相对于氧化还原费米能(ε(redox))的相对位置来合理化。电化学阻抗光谱获得的交换电流密度的定量分析表明,电荷通过分子势垒的输运增强强烈依赖于 QD 价带边缘相对于 ε(redox)的位置。基于电子转移的 Gerischer 模型,估计了通过 QD 组装体的平均电子隧穿速率常数。