Center for Biotechnology, University of Nebraska, Lincoln, NE 68588, USA.
BMC Plant Biol. 2010 Nov 5;10:238. doi: 10.1186/1471-2229-10-238.
The molecular mechanisms of genome reprogramming during transcriptional responses to stress are associated with specific chromatin modifications. Available data, however, describe histone modifications only at individual plant genes induced by stress. We have no knowledge of chromatin modifications taking place at genes whose transcription has been down-regulated or on the genome-wide chromatin modification patterns that occur during the plant's response to dehydration stress.
Using chromatin immunoprecipitation and deep sequencing (ChIP-Seq) we established the whole-genome distribution patterns of histone H3 lysine 4 mono-, di-, and tri-methylation (H3K4me1, H3K4me2, and H3K4me3, respectively) in Arabidopsis thaliana during watered and dehydration stress conditions. In contrast to the relatively even distribution of H3 throughout the genome, the H3K4me1, H3K4me2, and H3K4me3 marks are predominantly located on genes. About 90% of annotated genes carry one or more of the H3K4 methylation marks. The H3K4me1 and H3K4me2 marks are more widely distributed (80% and 84%, respectively) than the H3K4me3 marks (62%), but the H3K4me2 and H3K4me1 levels changed only modestly during dehydration stress. By contrast, the H3K4me3 abundance changed robustly when transcripts levels from responding genes increased or decreased. In contrast to the prominent H3K4me3 peaks present at the 5'-ends of most transcribed genes, genes inducible by dehydration and ABA displayed atypically broader H3K4me3 distribution profiles that were present before and after the stress.
A higher number (90%) of annotated Arabidopsis genes carry one or more types of H3K4me marks than previously reported. During the response to dehydration stress the changes in H3K4me1, H3K4me2, and H3K4me3 patterns show different dynamics and specific patterns at up-regulated, down-regulated, and unaffected genes. The different behavior of each methylation mark during the response process illustrates that they have distinct roles in the transcriptional response of implicated genes. The broad H3K4me3 distribution profiles on nucleosomes of stress-induced genes uncovered a specific chromatin pattern associated with many of the genes involved in the dehydration stress response.
转录响应应激过程中基因组重编程的分子机制与特定的染色质修饰有关。然而,现有数据仅描述了应激诱导的个别植物基因的组蛋白修饰。我们不知道转录下调的基因或在植物响应脱水胁迫过程中发生的全基因组染色质修饰模式上发生的染色质修饰。
使用染色质免疫沉淀和深度测序(ChIP-Seq),我们在拟南芥水培和脱水胁迫条件下建立了组蛋白 H3 赖氨酸 4 单、二和三甲基化(H3K4me1、H3K4me2 和 H3K4me3,分别)在整个基因组上的分布模式。与 H3 在基因组中相对均匀的分布相比,H3K4me1、H3K4me2 和 H3K4me3 标记主要位于基因上。大约 90%的注释基因携带一个或多个 H3K4 甲基化标记。H3K4me1 和 H3K4me2 标记的分布更为广泛(分别为 80%和 84%),而 H3K4me3 标记的分布较少(62%),但在脱水胁迫期间,H3K4me2 和 H3K4me1 水平的变化仅略有变化。相比之下,当响应基因的转录物水平增加或减少时,H3K4me3 的丰度会发生显著变化。与大多数转录基因 5'-末端存在的明显 H3K4me3 峰相反,脱水和 ABA 诱导的基因显示出异常广泛的 H3K4me3 分布谱,这些谱在胁迫之前和之后都存在。
比以前报道的更多数量(90%)的注释拟南芥基因携带一种或多种类型的 H3K4me 标记。在响应脱水胁迫过程中,H3K4me1、H3K4me2 和 H3K4me3 模式的变化显示出上调、下调和未受影响基因的不同动态和特定模式。每种甲基化标记在响应过程中的不同行为表明它们在涉及脱水胁迫响应的基因的转录响应中具有不同的作用。在胁迫诱导基因核小体上发现的广泛的 H3K4me3 分布谱揭示了与许多参与脱水胁迫响应的基因相关的特定染色质模式。