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Photothermal measurements on optical thin films.

作者信息

Welsch E, Ristau D

出版信息

Appl Opt. 1995 Nov 1;34(31):7239-53. doi: 10.1364/AO.34.007239.

DOI:10.1364/AO.34.007239
PMID:21060591
Abstract

An overview of the application of the photothermal technique for optical as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomogeneities in thin films on their laser-damage resistance.

摘要

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