Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
J Microsc. 2010 Dec;240(3):227-38. doi: 10.1111/j.1365-2818.2010.03401.x.
Focussed ion beam milling has greatly extended the utility of the atom probe and transmission electron microscope because it enables sample preparation with a level of dimensional control never before possible. Using focussed ion beam it is possible to extract the samples from desired and very specific locations. The artefacts associated with this sample preparation method must also be fully understood. In this work, issues specifically relevant to the focussed ion beam milling of aluminium alloys are presented. After using the focussed ion beam as a sample preparation technique it is evident that gallium will concentrate in three areas of the sample: on the surface, on grain boundaries and at interphase boundaries. This work also shows that low-energy Ar ion nanomilling is potentially quite effective for removing gallium implantation layers and gallium from the internal surfaces of aluminium thin foils.
聚焦离子束铣削极大地扩展了原子探针和透射电子显微镜的应用范围,因为它能够以前所未有的尺寸控制水平进行样品制备。使用聚焦离子束,可以从所需的非常特定的位置提取样品。还必须充分了解与这种样品制备方法相关的伪影。在这项工作中,提出了与聚焦离子束铣削铝合金特别相关的问题。在使用聚焦离子束作为样品制备技术之后,很明显,镓将集中在样品的三个区域:表面、晶界和相间边界。这项工作还表明,低能氩离子纳米铣削对于去除铝薄膜内部表面的镓注入层和镓可能非常有效。