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氧化铪及共蒸发的氧化铪:氟化镁薄膜的光学性质。

Optical properties of hafnia and coevaporated hafnia:magnesium fluoride thin films.

作者信息

Tsou Y, Ho F C

出版信息

Appl Opt. 1996 Sep 1;35(25):5091-4. doi: 10.1364/AO.35.005091.

Abstract

Mixed films of HfO(2) and MgF(2) were prepared by the e-beam coevaporation of two source materials with or without the presence of ion assistance. Optical properties and hardness of mixed films were compared among various compositions that were achieved by controlling the deposition rate of MgF(2). Results obtained from pure materials confirmed the densification of HfO(2) and the increased absorption in MgF(2) with a higher discharge voltage. A refractive index of a composite film from 1.38 to 1.91 was achievable with various HfO(2):MgF(2) deposition rate ratios. A low-index composite material with improved hardness may be substituted for the soft MgF(2).

摘要

通过对两种源材料进行电子束共蒸发,在有或没有离子辅助的情况下制备了HfO(2)和MgF(2)的混合薄膜。通过控制MgF(2)的沉积速率,比较了不同成分混合薄膜的光学性能和硬度。从纯材料获得的结果证实,随着放电电压的升高,HfO(2)致密化,MgF(2)中的吸收增加。通过不同的HfO(2):MgF(2)沉积速率比,可以实现复合薄膜的折射率从1.38到1.91。一种硬度提高的低折射率复合材料可以替代柔软的MgF(2)。

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