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通过分子束沉积获得的用于紫外线辐射的减反射涂层。

Antireflection coatings for UV radiation obtained by molecular-beam deposition.

作者信息

Laux S, Mann K, Granitza B, Kaiser U, Richter W

出版信息

Appl Opt. 1996 Nov 1;35(31):6216-8. doi: 10.1364/AO.35.006216.

Abstract

We have developed fluoride antireflection (AR) coatings on MgF(2) substrates for a wavelength of 248 nm by molecular-beam deposition. Transmission and laser-induced damage threshold of the samples were measured and atomic force microscope (AFM) investigations were carried out. We compare a 14-layer design for AR coatings with sublayer thicknesses of 12 nm with a conventional two-layer design with quarter-wavelength thicknesses. The laser-induced damage threshold of the 14-layer coating is slightly higher than that of the two-layer coating. The AFM surface images show that the 14-layer coating has a smoother surface than the two-layer coating.

摘要

我们通过分子束沉积在MgF₂衬底上制备了用于248nm波长的氟化物减反射(AR)涂层。测量了样品的透射率和激光诱导损伤阈值,并进行了原子力显微镜(AFM)研究。我们将子层厚度为12nm的14层AR涂层设计与具有四分之一波长厚度的传统两层设计进行了比较。14层涂层的激光诱导损伤阈值略高于两层涂层。AFM表面图像显示,14层涂层的表面比两层涂层更光滑。

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