Department of Chemical and Biological Engineering, Seoul National University, Shilim-9-Dong, Gwanak-Gu, Seoul 151-744, Republic of Korea.
J Colloid Interface Sci. 2011 Feb 15;354(2):650-61. doi: 10.1016/j.jcis.2010.10.068. Epub 2010 Nov 8.
Phase-separated surfaces of blends of polystyrene (PS) and well ordered comb-like polymer, poly[(oxy(decylsulfonylmethyl)ethylene)] (CH(3)-10SE), were prepared by spin casting polymer mixtures. Various surface morphologies, such as holes, islands, connected islands and pillars, were prepared by changing the blend compositions. Due to the influence of the CH(3)-10SE domain with a well ordered molecular conformation, a very low energy surface (≈22mN/m) was created, which is close to the value of the pure polymer (≈20mN/m), even when the blends contained only 20wt.% of the pure polymer. Furthermore, by selective etching the PS domain in the blend surfaces, the advancing contact angles of water and n-hexadecane were highly increased from 113.5° and 43.2° for the pure CH(3)-10SE surface to 133.3° and 67.2° for the CH(3)-10SE structural surfaces with holes prepared using the solvent etching method, respectively. The result of the water advancing contact angles measured on the samples immersed in water over 20days showed that the film stability of CH(3)-10SE could be improved considerably by even adding small amounts of PS.
通过旋涂聚合物混合物，制备了聚苯乙烯（PS）和有序梳状聚合物聚[（氧（癸基磺酰基甲基）乙烯）]（CH(3)-10SE）共混物的分相表面。通过改变共混物组成，可以制备各种表面形貌，如孔、岛、连接岛和支柱。由于 CH(3)-10SE 具有有序分子构象的畴的影响，形成了非常低能量的表面（≈22mN/m），即使共混物仅含有 20wt.%的纯聚合物，其值也接近纯聚合物（≈20mN/m）。此外，通过选择性刻蚀共混物表面的 PS 畴，水和正十六烷在纯 CH(3)-10SE 表面上的前进接触角分别从 113.5°和 43.2°高度增加到通过溶剂刻蚀法制备的具有孔的 CH(3)-10SE 结构表面上的 133.3°和 67.2°。在水中浸泡超过 20 天的样品上测量的水前进接触角的结果表明，即使添加少量 PS 也可以显著提高 CH(3)-10SE 的薄膜稳定性。
