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激光辅助绝缘氧化物场蒸发的机理。

Mechanism of laser assisted field evaporation from insulating oxides.

机构信息

WPI-AIMR, Tohoku University, 2-1-1 Katahira, Aobaku, Sendai, Japan.

出版信息

Ultramicroscopy. 2011 May;111(6):567-70. doi: 10.1016/j.ultramic.2010.11.011. Epub 2010 Dec 1.

Abstract

To explain the recent successful three-dimensional atom probe (3DAP) analyses of insulating oxides by laser assisted field evaporation, we investigated the mechanism of the laser-induced field evaporation of oxides by ab initio calculations. The calculated potential energy surfaces (PESs) for the ground and excited states indicated that the activation barrier height for field evaporation is substantially reduced by the accumulation of holes near the tip apex. This would make the direct electronic excitation possible to promote field evaporation along with thermal excitation. These theoretical calculations are supported by experimental observations.

摘要

为了解释最近通过激光辅助场蒸发成功分析绝缘氧化物的三维原子探针 (3DAP),我们通过从头计算研究了氧化物激光诱导场蒸发的机制。计算得到的基态和激发态势能表面 (PES) 表明,尖端附近空穴的积累大大降低了场蒸发的激活势垒高度。这将使电子直接激发成为可能,从而促进场蒸发和热激发。这些理论计算得到了实验观察的支持。

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