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激光辅助绝缘衬底薄膜原子探针分析。

Laser assisted atom probe analysis of thin film on insulating substrate.

机构信息

Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-0047, Japan.

出版信息

Ultramicroscopy. 2011 May;111(6):557-61. doi: 10.1016/j.ultramic.2010.11.008. Epub 2010 Nov 19.

Abstract

We demonstrate that the atom probe analyses of metallic thin films on insulating substrates are possible using laser assisted field evaporation. The tips with metallic thin film and insulating substrate (0.6-3 μm in thickness) were prepared by the lift-out and annular ion beam milling techniques on tungsten supports. In spite of the existence of thick insulating layer between the metallic film and the tungsten support, atom probe tomography with practical mass resolution, signal-to-noise ratio and spatial resolution was found to be possible using laser assisted field evaporation.

摘要

我们证明了使用激光辅助场蒸发可以对绝缘衬底上的金属薄膜进行原子探针分析。带有金属薄膜和绝缘衬底(厚度为 0.6-3μm)的针尖是在钨基底上通过提拉和环形离子束铣削技术制备的。尽管金属薄膜和钨基底之间存在厚的绝缘层,但使用激光辅助场蒸发仍然可以实现具有实际质量分辨率、信噪比和空间分辨率的原子探针断层成像。

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