Hitachi Global Storage Technologies Incorporated, San Jose Research Center, San Jose, CA 95135, USA.
Nanotechnology. 2011 Jan 21;22(3):035603. doi: 10.1088/0957-4484/22/3/035603. Epub 2010 Dec 9.
We report an original iterative method for fabricating three-dimensional mesoporous structures by independently stacking multiple self-assembled block copolymer films supported by Si membranes. A first layer is formed on the substrate by a self-assembled PS-b-PMMA (polystyrene-block-poly(methyl methacrylate)) film. A porous, permeable Si membrane deposited on top of the first block copolymer film provides mechanical support, preventing pattern collapse during the wet developing used to selectively remove the PMMA component of the PS-b-PMMA film. A second, dense Si membrane is deposited to seal the porous membrane, resulting in an impermeable coating suspended atop the self-assembled mesoporous polystyrene structures. The process can then be iterated using the sealed membrane as the new substrate to support a subsequent self-assembled block copolymer film. This multilayer approach provides a flexible three-dimensional fabrication technique where, in each layer, pattern morphology, domain orientation and degree of ordering can be designed independently. Furthermore, the process is compatible with electron-beam directed assembly, used to achieve regular patterns with feature density multiplication at any level in the stack.
我们报告了一种原始的迭代方法,通过独立堆叠多个由 Si 膜支撑的自组装嵌段共聚物膜来制造三维介孔结构。首先通过自组装 PS-b-PMMA(聚苯乙烯嵌段-聚甲基丙烯酸甲酯)膜在基底上形成一层。沉积在第一层嵌段共聚物膜顶部的多孔、可渗透的 Si 膜提供机械支撑,防止在用于选择性去除 PS-b-PMMA 膜的 PMMA 组分的湿开发过程中图案塌陷。沉积第二层致密 Si 膜以密封多孔膜,从而在自组装介孔聚苯乙烯结构的顶部形成不可渗透的涂层。然后可以使用密封膜作为新的基底重复该过程,以支撑随后的自组装嵌段共聚物膜。这种多层方法提供了一种灵活的三维制造技术,其中在每个层中,可以独立设计图案形态、畴取向和有序度。此外,该过程与电子束定向组装兼容,可用于在堆叠中的任何层实现具有特征密度倍增的规则图案。