Laboratoires d'Electronique Philips (LEP), 22 Avenue Descartes, BP15, 94453 Limeil-Brevannes Cedex, France.
J Xray Sci Technol. 1992 Jan 1;3(2):118-32. doi: 10.3233/XST-1992-3204.
W/Mg2Si multilayers for soft x-ray optics above the MgKα and MgLα lines have been deposited by RF sputtering. Their structural characteristics have been deduced from in situ kinetic ellipsometry, ex situ grazing x-ray reflection measurements, and high-resolution electron microscopy. Their soft x-ray performances have been measured by synchrotron radiation around the MgKα and MgLα lines and related to the structural characteristics. For short wavelengths, first Bragg peak reflectivities as high as 31% have been measured for multilayers with double period equal to 84 Å. For samples with smaller layer thicknesses, these performances decrease due to finite interdiffusion at the interfaces. Nevertheless, well-defined Bragg peaks are observed even when the double period is as low as 44 Å. Near the MgLα line, more than 20% reflectivity at the first Bragg peak has been measured at normal incidence. At the same wavelength the selectivity is two times higher than that of conventional systems such as Mo/Si.
采用射频磁控溅射技术在 MgKα 和 MgLα 线以上沉积了 W/Mg2Si 多层膜。通过原位动力学椭圆测量法、外在位掠入射 X 射线反射测量法和高分辨率电子显微镜对其结构特性进行了推断。利用同步辐射在 MgKα 和 MgLα 线附近对其软 X 射线性能进行了测量，并与结构特性进行了关联。对于短波长，当双层周期等于 84 Å 时，多层膜的第一布拉格反射率高达 31%。对于层厚度较小的样品，由于界面处的有限互扩散，这些性能会降低。然而，即使双层周期低至 44 Å，也可以观察到清晰的布拉格峰。在接近 MgLα 线的位置，在正入射时测量到第一布拉格峰的反射率超过 20%。在相同波长下，其选择性是传统系统（如 Mo/Si）的两倍。
