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X射线宽带镍/碳化硅多层膜:采用钨阻挡层的改进

X-ray broadband Ni/SiC multilayers: improvement with W barrier layers.

作者信息

Emprin B, Troussel Ph, Soullié G, Stemmler Ph, Mercère P, Meltchakov E, Jérôme A, Delmotte F

出版信息

Opt Express. 2014 Oct 20;22(21):25853-65. doi: 10.1364/OE.22.025853.

DOI:10.1364/OE.22.025853
PMID:25401618
Abstract

We present an experimental study and performance improvement of periodic and aperiodic Ni/SiC multilayer coatings. Periodic Ni/SiC multilayer mirrors have been coated and characterized by grazing incidence X-ray reflectometry at 8.048 keV (Cu Kα radiation) and by measurements at 3 keV and 5 keV on synchrotron radiation facilities. An interdiffusion effect is found between Ni and SiC layers. A two-material model, Ni(x)Si(y)/SiC, using a silicide instead of Ni, was used to fit the measurements. The addition of 0.6 nm W barrier layers at the interfaces allows a significant reduction of the interdiffusion between Ni and SiC. In order to obtain a specific reflectivity profile in the 2 - 8 keV energy range, we have designed and coated aperiodic multilayer mirrors by using Ni/SiC with and without W barrier layers. The experimental reflectivity profiles as a function of the photon energy were measured on a synchrotron radiation facility in both cases. Adding W barrier layers in Ni/SiC multilayers provides a better precision on the layer thicknesses and a very good agreement between the experimental data and the targeted spectral profile.

摘要

我们展示了周期性和非周期性Ni/SiC多层涂层的实验研究及性能改进。已制备周期性Ni/SiC多层镜,并通过在8.048 keV(铜Kα辐射)下的掠入射X射线反射测量以及在同步辐射设施上3 keV和5 keV的测量对其进行表征。发现Ni层与SiC层之间存在互扩散效应。使用一种用硅化物替代Ni的双材料模型Ni(x)Si(y)/SiC来拟合测量结果。在界面处添加0.6 nm的W阻挡层可显著减少Ni与SiC之间的互扩散。为了在2 - 8 keV能量范围内获得特定的反射率分布,我们设计并制备了带有和不带有W阻挡层的Ni/SiC非周期性多层镜。在这两种情况下,均在同步辐射设施上测量了作为光子能量函数的实验反射率分布。在Ni/SiC多层膜中添加W阻挡层可提高层厚度的精度,并使实验数据与目标光谱分布非常吻合。

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