Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, 1406 W Green Street, Urbana, IL 61801, USA.
Nanotechnology. 2011 Apr 15;22(15):155302. doi: 10.1088/0957-4484/22/15/155302. Epub 2011 Mar 10.
In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates--analogous to polymer patterning in nano-imprint lithography--is explored. Silver sulfide (Ag₂S)--a superionic conductor with excellent microforming properties--is investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming and feature recovery after embossing, are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps < 10 nm were successfully fabricated. The possibility for large area patterning with stamp diameters > 6 mm is also demonstrated. Embossing-based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported.
本文报道了使用压印固态电化学印模直接成型金属纳米结构的方法。我们探索了使用 Si 模板对固态超离子印模进行微成型的方法，这类似于纳米压印光刻中的聚合物成型。硫化银（Ag₂S）——一种具有优异微成型性能的超离子导体——被用作候选材料。研究了超离子印模的重要参数，包括机械性能、成型过程中的材料流动以及压印后的特征恢复。在压印和刻蚀过程中都观察到了优异的特征可转移性。为了说明这种方法的能力，成功制备了具有 < 10nm 间隙的银纳米天线。还证明了使用直径 > 6mm 的印模进行大面积成型的可能性。基于压印的金属成型方法允许进行超越二维纳米制造的制造，并且报告了几种成型方案。
