Department of Engineering Science, Simon Fraser University, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada.
Nanotechnology. 2013 Feb 8;24(5):055304. doi: 10.1088/0957-4484/24/5/055304. Epub 2013 Jan 16.
Replication of surface nano-structures from a master stamp allows large-area volume production that is otherwise cost prohibitive through conventional direct-write methods, such as electron beam lithography and focused ion beam milling. However, the creation of a master stamp containing sophisticated patterns still requires significant time on such direct-write tools. We demonstrate a method for reducing this tool time by patterning smaller nano-structures, and then enlarging them to the desired size through isotropic etching. We can create circular structures of any arrangement and size, down to the patterning limits of the direct-write tools. Subsequent metal mask deposition, lift-off, and anisotropic etching transforms the circular patterns to out-of-plane pillar structures for the final stamp. A 1 cm(2) area filled with a pattern of 200 nm diameter nano-holes spaced 520 nm apart, requires only 21 h to complete using our process, compared to 75 h using conventional fabrication. We demonstrate the utility and practicality of the quartz stamps through polymer embossing and replication. Embossed polymer nano-hole arrays are coated with a Cr/Au (5/100 nm) film to create surface plasmon resonance structures. Extraordinary optical transmission spectra from the metallized arrays show the expected spectral features when compared to focused ion beam milled structures.
从母版印章复制表面纳米结构可以通过常规的直写方法（如电子束光刻和聚焦离子束铣削）进行大面积批量生产，否则成本过高。然而，创建包含复杂图案的母版印章仍然需要在这些直写工具上花费大量时间。我们展示了一种通过对较小的纳米结构进行图案化，然后通过各向同性蚀刻将其放大到所需尺寸来减少这种工具时间的方法。我们可以创建任何排列和尺寸的圆形结构，其最小尺寸可达直写工具的图案化限制。随后的金属掩模沉积、剥离和各向异性蚀刻将圆形图案转换为最终印章的离面立柱结构。使用我们的工艺，只需 21 小时即可完成一个 1cm²面积的 200nm 直径纳米孔图案，孔间距为 520nm，而使用传统制造方法则需要 75 小时。我们通过聚合物压印和复制证明了石英印章的实用性和实用性。压印的聚合物纳米孔阵列涂有 Cr/Au（5/100nm）薄膜，以制造表面等离子体共振结构。与聚焦离子束铣削结构相比，金属化阵列的非凡光传输光谱显示出预期的光谱特征。
