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Determination of the photocarrier diffusion length in intrinsic Ge nanowires.

作者信息

Shin Yun-Sok, Lee Donghun, Lee Hyun-Seung, Cho Yong-Jun, Kim Cheol-Joo, Jo Moon-Ho

机构信息

Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, South Korea.

出版信息

Opt Express. 2011 Mar 28;19(7):6119-24. doi: 10.1364/OE.19.006119.

Abstract

We quantitatively determined the photocarrier diffusion length in intrinsic Ge nanowires (NWs) using scanning photocurrent microscopy. Specifically, the spatial mapping of one-dimensional decay in the photocurrent along the Ge NWs under the scanning laser beam (λ= 532 nm) was analyzed in a one-dimensional diffusion rate equation to extract the diffusion length of ~4-5 μm. We further attempt to determine the photocarrier lifetime under a finite bias across the Ge NWs, and discuss the role of surface scattering.

摘要

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