直接写入多光子光刻技术对超薄膜聚合物的化学图案化。
Chemical patterning of ultrathin polymer films by direct-write multiphoton lithography.
机构信息
Laser Thermal Laboratory, Department of Mechanical Engineering, University of California, Berkeley, California 94720, USA.
出版信息
J Am Chem Soc. 2011 Apr 27;133(16):6138-41. doi: 10.1021/ja200313q. Epub 2011 Mar 31.
We applied 2-photon laser ablation to write subdiffraction nanoscale chemical patterns into ultrathin polymer films under ambient conditions. Poly(ethylene glycol) methacrylate brush layers were prepared on quartz substrates via surface-initiated atom-transfer radical polymerization and ablated to expose the underlying substrate using the nonlinear 2-photon absorbance of a frequency-doubled Ti:sapphire femtosecond laser. Single-shot ablation thresholds of polymer films were ~1.5 times smaller than that of a quartz substrate, which allowed patterning of nanoscale features without damage to the underlying substrate. At a 1/e(2) laser spot diameter of 0.86 μm, the features of exposed substrate approached ~80 nm, well below the diffraction limit for 400 nm light. Ablated features were chemically distinct and amenable to chemical modification.
我们应用双光子激光烧蚀技术，在环境条件下将亚衍射纳米尺度的化学图案写入超薄聚合物薄膜中。通过表面引发原子转移自由基聚合，在石英衬底上制备聚（乙二醇）甲基丙烯酸酯刷层，并使用倍频钛宝石飞秒激光的非线性双光子吸收将其烧蚀以暴露下面的衬底。聚合物薄膜的单次烧蚀阈值比石英衬底小约 1.5 倍，这允许在不损坏下面衬底的情况下对纳米尺度的特征进行图案化。在 1/e(2)激光光斑直径为 0.86 μm 的情况下，暴露的衬底特征接近 80 nm，远低于 400nm 光的衍射极限。烧蚀的特征在化学上是不同的，并且可以进行化学修饰。
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