ASIC & System State Key Laboratory, Department of Microelectronics, Fudan University, Shanghai 200433, China.
Langmuir. 2011 May 3;27(9):5167-70. doi: 10.1021/la200377b. Epub 2011 Apr 8.
It is well known that photochemical reaction in an aqueous solution can be chosen by selectively patterning the domain structures of ferroelectrics. In this work, we investigate the photochemically induced deposition of Ag particles on ferroelectric lead zirconate titanate [Pb(Zr(x),Ti(1 - x))O(3)] nanowires fabricated by nanoembossing technology. The photochemical reduction of Ag particles is found to occur preferentially along the embossed nanowires. By imaging domain configurations of the embossed films using the piezoresponse force microscope, the spatially selective deposition of Ag particles can be associated with the underlying ferroelectric domain structures created by the nanoembossing process. The controllable and selective deposition of metal species onto nanoembossed ferroelectric nanostructures without the need for an external electrical field is promising for providing a new route to nanoferroelectric lithography.
众所周知，通过选择性地对铁电体的畴结构进行图案化，可以选择水溶液中的光化学反应。在这项工作中，我们研究了通过纳米压印技术制备的铁电锆钛酸铅[Pb(Zr(x),Ti(1-x))O(3)]纳米线在光化学诱导下沉积 Ag 颗粒的情况。发现 Ag 颗粒的光化学还原优先沿压印纳米线发生。通过使用压电力显微镜对压印薄膜的畴结构进行成像，Ag 颗粒的空间选择性沉积可以与纳米压印过程中产生的铁电畴结构相关联。无需外部电场即可将金属物种可控且选择性地沉积到纳米压印铁电纳米结构上，这为纳米铁电光刻提供了一种新途径。
